Debe Arlook  (b. 1962) is an American artist based in Los Angeles. A native of New Jersey, Arlook studied filmmaking and psychology at American University, Washington, DC. 

Arlook is a 2021, 2020 Critical Mass Finalist and 2020 Photo LA Top 20 Finalist. She exhibits at national venues such as Rick Wester Fine Art, (New York City, NY), Griffin Museum of Photography (Winchester,MA), Center for Photographic Arts (Carmel, CA), Museum of Art & History (Lancaster, CA), California State University (Los Angeles, CA),  San Diego Art Institute (San Diego, CA). International venues include Lishui Art Museum, (Lishui, China,) FotoNostrum, (Barcelona, Spain) and Fahle Galerii Art Gallery (Tallinn, Estonia).  She's published in L’Oeil de la Photographie, Rangefinder, Shots Magazine, What Will You Remember, among others. Her work will be the focus of study at Universitè of Touluse-Jean Juarès, France 2022/2023.

In addition to her own studio practice, Arlook is a Pasadena Photography Arts Advisor, Curator  for FORUM and Open Show Pasadena/East Los Angeles. She is a Contributing Editor and Resource Manager for the Photobook Journal. Arlook transitioned from the darkroom to inkjet printing, and founded Arlook Printing Services, providing project consultation and archival printing for fine art photographers.

Debe's work is represented by Posner Fine Art  (Los Angeles, CA) and VICA, Venice Institute of Contemporary Art (Venice, CA). 

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